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dc.contributor.authorChu, Tian-Jianen_US
dc.contributor.authorChang, Ting-Changen_US
dc.contributor.authorTsai, Tsung-Mingen_US
dc.contributor.authorWu, Hsing-Huaen_US
dc.contributor.authorChen, Jung-Huien_US
dc.contributor.authorChang, Kuan-Changen_US
dc.contributor.authorYoung, Tai-Faen_US
dc.contributor.authorChen, Kai-Hsangen_US
dc.contributor.authorSyu, Yong-Enen_US
dc.contributor.authorChang, Geng-Weien_US
dc.contributor.authorChang, Yao-Fengen_US
dc.contributor.authorChen, Min-Chenen_US
dc.contributor.authorLou, Jyun-Haoen_US
dc.contributor.authorPan, Jhih-Hongen_US
dc.contributor.authorChen, Jian-Yuen_US
dc.contributor.authorTai, Ya-Hsiangen_US
dc.contributor.authorYe, Congen_US
dc.contributor.authorWang, Haoen_US
dc.contributor.authorSze, Simon M.en_US
dc.date.accessioned2014-12-08T15:30:22Z-
dc.date.available2014-12-08T15:30:22Z-
dc.date.issued2013-04-01en_US
dc.identifier.issn0741-3106en_US
dc.identifier.urihttp://dx.doi.org/10.1109/LED.2013.2242843en_US
dc.identifier.urihttp://hdl.handle.net/11536/21712-
dc.description.abstractIn this letter, we presented that the charge quantity is the critical factor for forming process. Forming is a pivotal process in resistance random access memory to activate the resistance switching behavior. However, overforming would lead to device damage. In general, the overshoot current has been considered as a degradation reason during the forming process. In this letter, the quantity of charge through the switching layer has been proven as the key element in the formation of the conduction path. Ultrafast pulse forming can form a discontinuous conduction path to reduce the operation power.en_US
dc.language.isoen_USen_US
dc.subjectForming processen_US
dc.subjecthafnium oxide (HfO2)en_US
dc.subjectnonvolatile memoryen_US
dc.subjectresistance switchingen_US
dc.titleCharge Quantity Influence on Resistance Switching Characteristic During Forming Processen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/LED.2013.2242843en_US
dc.identifier.journalIEEE ELECTRON DEVICE LETTERSen_US
dc.citation.volume34en_US
dc.citation.issue4en_US
dc.citation.spage502en_US
dc.citation.epage504en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000316813100009-
dc.citation.woscount17-
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