標題: Enhanced Light Output Power and Growth Mechanism of GaN-Based Light-Emitting Diodes Grown on Cone-Shaped SiO2 Patterned Template
作者: Lin, Da-Wei
Huang, Jhih-Kai
Lee, Chia-Yu
Chang, Ruey-Wen
Lan, Yu-Pin
Lin, Chien-Chung
Lee, Kang-Yuan
Lin, Chung-Hsiang
Lee, Po-Tsung
Chi, Gou-Chung
Kuo, Hao-Chung
光電系統研究所
光電工程學系
Institute of Photonic System
Department of Photonics
關鍵字: Epitaxial lateral overgrowth (ELOG);internal quantum efficiency (IQE);light extraction efficiency (LEE);light-emitting diodes (LEDs);nano-imprint lithography (NIL)
公開日期: 1-四月-2013
摘要: In this study, we successfully transferred the patterns of a cone-shaped patterned sapphire substrate (CPSS) into SiO2 layer to fabricate a cone-shaped SiO2 patterned template by using nanoimprint lithography (NIL). The GaN-based light-emitting diodes (LEDs) were grown on this template by metal-organic chemical vapor deposition (MOCVD). The transmission electron microscopy (TEM) images suggest that the stacking faults formed near the cone-shaped SiO2 patterns during the epitaxial lateral overgrowth (ELOG) can effectively suppress the threading dislocations, which results in an enhancement of internal quantum efficiency. The Monte Carlo ray-tracing simulation reveals that the light extraction efficiency of the LED grown on cone-shaped SiO2 patterned template can be enhanced as compared with the LED grown on CPSS. As a result, the light output power of the LED grown on cone-shaped SiO2 patterned template outperformed the LED grown on CPSS.
URI: http://dx.doi.org/10.1109/JDT.2012.2230395
http://hdl.handle.net/11536/21722
ISSN: 1551-319X
DOI: 10.1109/JDT.2012.2230395
期刊: JOURNAL OF DISPLAY TECHNOLOGY
Volume: 9
Issue: 4
起始頁: 285
結束頁: 291
顯示於類別:期刊論文


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