Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Fu, Yi-Keng | en_US |
dc.contributor.author | Lu, Yu-Hsuan | en_US |
dc.contributor.author | Xuan, Rong | en_US |
dc.contributor.author | Chen, Jenn-Fang | en_US |
dc.contributor.author | Su, Yan-Kuin | en_US |
dc.date.accessioned | 2014-12-08T15:31:58Z | - |
dc.date.available | 2014-12-08T15:31:58Z | - |
dc.date.issued | 2013-08-01 | en_US |
dc.identifier.issn | 0021-4922 | en_US |
dc.identifier.uri | http://dx.doi.org/10.7567/JJAP.52.08JK05 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/22576 | - |
dc.description.abstract | The work reports a theoretical and experimental study on the device performance of near ultraviolet light-emitting diodes (LEDs) with specific design on the electron blocking layer (EBL) by employing the band-engineering. The simulation results show the polarization-induced downward band bending is mitigated in the specific EBL design and, hence, the capability of hole transportation increases and the behavior of electron overflow decreases. The experimental results show the LEDs with specific EBL design exhibited a reduction of forward voltage from 4.40 to 4.07 V and a much enhancement of light output power from 30.6 to 51.9mW, compared with conventional LED. (C) 2013 The Japan Society of Applied Physics | en_US |
dc.language.iso | en_US | en_US |
dc.title | Hole Injection and Electron Overflow Improvement in 365 nm Light-Emitting Diodes by Band-Engineering Electron Blocking Layer | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.7567/JJAP.52.08JK05 | en_US |
dc.identifier.journal | JAPANESE JOURNAL OF APPLIED PHYSICS | en_US |
dc.citation.volume | 52 | en_US |
dc.citation.issue | 8 | en_US |
dc.citation.epage | en_US | |
dc.contributor.department | 電子物理學系 | zh_TW |
dc.contributor.department | Department of Electrophysics | en_US |
dc.identifier.wosnumber | WOS:000323883100133 | - |
dc.citation.woscount | 0 | - |
Appears in Collections: | Articles |
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