Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Cheng, Ya-Chi | en_US |
dc.contributor.author | Wu, Yung-Chun | en_US |
dc.contributor.author | Chen, Hung-Bin | en_US |
dc.contributor.author | Han, Ming-Hung | en_US |
dc.contributor.author | Lu, Nan-Heng | en_US |
dc.contributor.author | Su, Jun-Ji | en_US |
dc.contributor.author | Chang, Chun-Yen | en_US |
dc.date.accessioned | 2014-12-08T15:32:25Z | - |
dc.date.available | 2014-12-08T15:32:25Z | - |
dc.date.issued | 2013-09-16 | en_US |
dc.identifier.issn | 0003-6951 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1063/1.4821856 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/22752 | - |
dc.description.abstract | The breakdown voltage (V-BD) and breakdown mechanism of junctionless (JL) poly-Si thin film transistor (TFT) were compared to the conventional inversion-mode (IM) TFT using fabricated devices and 3D quantum-corrected hydrodynamic transport device simulation. The simulated results are correspondent with experimental ones. The analyses of electric field distributions in on-state show that the channel of JL devices can equally share the voltage like a resistor, because there are no junctions formed between channel and source/drain. The JL TFT shows excellent breakdown characteristics; the off-state V-BD of 53.4V is several times larger than V-BD of 9.5V in IM TFT with same device size. JL devices have large potential for high voltage power metal-oxide-semiconductor devices and circuit applications. (C) 2013 AIP Publishing LLC. | en_US |
dc.language.iso | en_US | en_US |
dc.title | High voltage characteristics of junctionless poly-silicon thin film transistors | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1063/1.4821856 | en_US |
dc.identifier.journal | APPLIED PHYSICS LETTERS | en_US |
dc.citation.volume | 103 | en_US |
dc.citation.issue | 12 | en_US |
dc.citation.epage | en_US | |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.identifier.wosnumber | WOS:000324826000085 | - |
dc.citation.woscount | 1 | - |
Appears in Collections: | Articles |
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