標題: Co-sputtered Cu/Ti Bonded Interconnects for 3D Integration Applications
作者: Chen, Hsiao-Yu
Hsu, Sheng-Yao
Chen, Kuan-Neng
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
關鍵字: 3D integration;co-sputtered metal bonding;self-formed adhesion layer
公開日期: 2013
摘要: Investigation of co-sputtered Cu/Ti as bonded interconnects for 3D integration is presented in this paper. The proposed structure has the features of self-formed adhesion layer, Cu as major bonding/conducting material, and potential Ti oxide as sidewall passivation. The excellent electrical performance and high electrical stability against humidity and electro-migration of this structure are achieved.
URI: http://hdl.handle.net/11536/22853
ISBN: 978-1-4673-3082-4
ISSN: 1524-766X
期刊: 2013 INTERNATIONAL SYMPOSIUM ON VLSI TECHNOLOGY, SYSTEMS, AND APPLICATIONS (VLSI-TSA)
Appears in Collections:Conferences Paper