Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Huang, Yu-Chih | en_US |
dc.contributor.author | Chou, Chia-Hsin | en_US |
dc.contributor.author | Liao, Chan-Yu | en_US |
dc.contributor.author | Tsai, Wan-Lin | en_US |
dc.contributor.author | Cheng, Huang-Chung | en_US |
dc.date.accessioned | 2014-12-08T15:33:04Z | - |
dc.date.available | 2014-12-08T15:33:04Z | - |
dc.date.issued | 2013-09-30 | en_US |
dc.identifier.issn | 0003-6951 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1063/1.4823818 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/23018 | - |
dc.description.abstract | Programmable metallization cell (PMC) memory devices with oxidized Cu-Ti alloy films as the bottom electrodes have been shown to exhibit a superior on/off state current ratio (memory window) of as high as 10(3) and endurance of 3000 cycles as compared to conventional pure copper and unoxidized Cu-Ti alloy electrodes. It was conjectured that the Cu-Ti alloy electrodes could obtain the appropriate amount of copper atoms to format and rupture the conductive filaments in the resistive switching layer. Furthermore, the oxidized Cu-Ti alloys could control the Cu cations from the Cu and Cu2O to the appropriate amountto achieve the most favorable PMC characteristics. (C) 2013 AIP Publishing LLC. | en_US |
dc.language.iso | en_US | en_US |
dc.title | High-performance resistive switching characteristics of programmable metallization cell with oxidized Cu-Ti electrodes | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1063/1.4823818 | en_US |
dc.identifier.journal | APPLIED PHYSICS LETTERS | en_US |
dc.citation.volume | 103 | en_US |
dc.citation.issue | 14 | en_US |
dc.citation.epage | en_US | |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.identifier.wosnumber | WOS:000325488500078 | - |
dc.citation.woscount | 1 | - |
Appears in Collections: | Articles |
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