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dc.contributor.authorTsai, Hui-Wenen_US
dc.contributor.authorKer, Ming-Douen_US
dc.contributor.authorLiu, Yi-Shengen_US
dc.contributor.authorChuang, Ming-Nanen_US
dc.date.accessioned2014-12-08T15:33:13Z-
dc.date.available2014-12-08T15:33:13Z-
dc.date.issued2013en_US
dc.identifier.isbn978-1-4673-4436-4en_US
dc.identifier.urihttp://hdl.handle.net/11536/23097-
dc.description.abstractProper layout and additional circuit solution have been proposed to solve the practical EOS failure induced by latchup test in an industry case of high-voltage integrated circuits (IC). The modified design has been implemented in 0.6-um 40-V BCD (Bipolar-CMOS-DMOS) process to successfully pass the 500-mA negative trigger current test. By eliminating overstress damages as happened in the prior work with only guard ring protection, the proposed solution can be adopted to implement high-voltage-applicable IC products which meet the requirement of industry applications with sufficient latchup immunity.en_US
dc.language.isoen_USen_US
dc.subjectLatchupen_US
dc.subjectelectrical overstress (EOS)en_US
dc.subjecthigh-voltage ICen_US
dc.subjectregulatoren_US
dc.titleAnalysis and Solution to Overcome EOS Failure Induced by Latchup Test in A High-Voltage Integrated Circuitsen_US
dc.typeProceedings Paperen_US
dc.identifier.journal2013 INTERNATIONAL SYMPOSIUM ON VLSI DESIGN, AUTOMATION, AND TEST (VLSI-DAT)en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000326882100004-
Appears in Collections:Conferences Paper