標題: | Space electric field concentrated effect for Zr:SiO2 RRAM devices using porous SiO2 buffer layer |
作者: | Chang, Kuan- Huang, Jen-wei Chang, Ting-Chang Tsai, Tsung-Ming Chen, Kai-Huang Young, Tai-Fa Chen, Jung-Hui Zhang, Rui Lou, Jen-Chung Huang, Syuan-Yong Pan, Yin-Chih Huang, Hui-Chun Syu, Yong-En Gan, Der-Shin Bao, Ding-Hua Sze, Simon M. 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
關鍵字: | RRAM;Porous SiO2;Space charge limited current;Zr |
公開日期: | 11-Dec-2013 |
摘要: | To improve the operation current lowing of the Zr:SiO2 RRAM devices, a space electric field concentrated effect established by the porous SiO2 buffer layer was investigated and found in this study. The resistive switching properties of the low-resistance state (LRS) and high-resistance state (HRS) in resistive random access memory (RRAM) devices for the single-layer Zr:SiO2 and bilayer Zr:SiO2/porous SiO2 thin films were analyzed and discussed. In addition, the original space charge limited current (SCLC) conduction mechanism in LRS and HRS of the RRAM devices using bilayer Zr:SiO2/porous SiO2 thin films was found. Finally, a space electric field concentrated effect in the bilayer Zr:SiO2/porous SiO2 RRAM devices was also explained and verified by the COMSOL Multiphysics simulation model. |
URI: | http://dx.doi.org/10.1186/1556-276X-8-523 http://hdl.handle.net/11536/23417 |
ISSN: | 1556-276X |
DOI: | 10.1186/1556-276X-8-523 |
期刊: | NANOSCALE RESEARCH LETTERS |
Volume: | 8 |
Issue: | |
結束頁: | |
Appears in Collections: | Articles |
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