完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Islamov, D. R. | en_US |
dc.contributor.author | Gritsenko, V. A. | en_US |
dc.contributor.author | Cheng, C. H. | en_US |
dc.contributor.author | Chin, A. | en_US |
dc.date.accessioned | 2014-12-08T15:34:04Z | - |
dc.date.available | 2014-12-08T15:34:04Z | - |
dc.date.issued | 2013-12-02 | en_US |
dc.identifier.issn | 0003-6951 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1063/1.4838297 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/23420 | - |
dc.description.abstract | Information regarding the conductivity type of Si/GeOx/Ni structures with various stoichiometry has been obtained using experiments on injection of minority carriers from n- and p-type silicon. Results show that non-stoichiometric GeOx films exhibit bipolar conductivity, that is, holes as well as electrons contribute to the charge transport. Stoichiometric GeO2 films exhibit unipolar electron conductivity. (C) 2013 AIP Publishing LLC. | en_US |
dc.language.iso | en_US | en_US |
dc.title | Evolution of the conductivity type in germania by varying the stoichiometry | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1063/1.4838297 | en_US |
dc.identifier.journal | APPLIED PHYSICS LETTERS | en_US |
dc.citation.volume | 103 | en_US |
dc.citation.issue | 23 | en_US |
dc.citation.epage | en_US | |
dc.contributor.department | 交大名義發表 | zh_TW |
dc.contributor.department | National Chiao Tung University | en_US |
dc.identifier.wosnumber | WOS:000328634900065 | - |
dc.citation.woscount | 0 | - |
顯示於類別: | 期刊論文 |