標題: Influence of fabrication conditions on characteristics of phenanthrenequinone-doped poly(methyl methacrylate) photopolymer for holographic memory
作者: Lin, Shiuan Huei
Cho, Sheng-Lung
Lin, June-Hua
Hsu, Ken Y.
Chi, Sien
電子物理學系
光電工程學系
Department of Electrophysics
Department of Photonics
關鍵字: Volume Holography;Optical storage materials;Photopolymer
公開日期: 1-Jun-2014
摘要: In this paper, we experimentally investigate the influence of the fabrication conditions on holographic characteristics in phenanthrenequinone-doped poly(methyl methacrylate) (PQ:PMMA) bulk photopolymer. In our investigation, the PQ:PMMA bulk samples are fabricated by use of a two-step thermopolymerization method. We firstly propose to monitor relative viscosity of the monomer solution during the sample preparation to obtain a reliable criterion for material fabrication. We then compare experimentally characteristics of 2-mm thick samples fabricated with different conditions for holographic memory. The results show that the conditions in the first step play a important rule for fabricating bulk PQ:PMMA samples with good optical uniformity. In addition, the conditions in the second step play the rule for controlling the concentration of residual monomer and determine holographic characteristics. These results can provide a useful rule for fabricating bulk PQ:PMMA photopolymers for further applications on volume holographic data storage. (C) 2014 Elsevier B.V. All rights reserved.
URI: http://dx.doi.org/10.1016/j.optcom.2014.01.024
http://hdl.handle.net/11536/24188
ISSN: 0030-4018
DOI: 10.1016/j.optcom.2014.01.024
期刊: OPTICS COMMUNICATIONS
Volume: 320
Issue: 
起始頁: 145
結束頁: 150
Appears in Collections:Articles


Files in This Item:

  1. 000333791300025.pdf

If it is a zip file, please download the file and unzip it, then open index.html in a browser to view the full text content.