DEPOSITION OF MOLYBDENUM CARBONITRIDE THIN-FILMS FROM MO(NBUT)2(NHBUT)2

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DC 欄位	值	語言
dc.contributor.author	CHIU, HT	en_US
dc.contributor.author	HO, WY	en_US
dc.contributor.author	CHUANG, SH	en_US
dc.date.accessioned	2014-12-08T15:03:54Z	-
dc.date.available	2014-12-08T15:03:54Z	-
dc.date.issued	1994-07-01	en_US
dc.identifier.issn	0884-2914	en_US
dc.identifier.uri	http://hdl.handle.net/11536/2433	-
dc.description.abstract	Mo(NBut)2(NHBut)2 is used as a single-source precursor to deposit thin films of cubic phase molybdenum carbonitride, MoC(x)N(y), (x: 0.2-0.55, y: 0.1-0.47), by chemical vapor deposition on silicon substrates. in general, the C/Mo ratios increased from 0.2 to 0.55 and the N/Mo ratios decreased from 0.47 to 0.1 with increasing the temperature of deposition from 773 to 923 K. Based on the elemental composition and the composition of the gas phase products, it is proposed that the carbon atoms were incorporated through beta-methyl activation of the ligands.	en_US
dc.language.iso	en_US	en_US
dc.title	DEPOSITION OF MOLYBDENUM CARBONITRIDE THIN-FILMS FROM MO(NBUT)2(NHBUT)2	en_US
dc.type	Note	en_US
dc.identifier.journal	JOURNAL OF MATERIALS RESEARCH	en_US
dc.citation.volume	9	en_US
dc.citation.issue	7	en_US
dc.citation.spage	1622	en_US
dc.citation.epage	1624	en_US
dc.contributor.department	交大名義發表	zh_TW
dc.contributor.department	應用化學系	zh_TW
dc.contributor.department	National Chiao Tung University	en_US
dc.contributor.department	Department of Applied Chemistry	en_US
dc.identifier.wosnumber	WOS:A1994NU76000003	-
dc.citation.woscount	6	-
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