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dc.contributor.authorYu, Cheng-Changen_US
dc.contributor.authorHsu, Yu-Tingen_US
dc.contributor.authorLan, Wen-Howen_US
dc.contributor.authorShih, Ming-Changen_US
dc.contributor.authorHong, Jin-Huaen_US
dc.contributor.authorHuang, Kai-Fengen_US
dc.contributor.authorHuang, Chien-Jungen_US
dc.date.accessioned2014-12-08T15:36:12Z-
dc.date.available2014-12-08T15:36:12Z-
dc.date.issued2014en_US
dc.identifier.isbn978-1-315-81573-2; 978-1-138-00117-6en_US
dc.identifier.urihttp://hdl.handle.net/11536/24551-
dc.description.abstractThe ZnO thin film prepared after the 600 degrees C oxidation of thermally-evaporated Zn thin film on sapphire substrate was studied. A nano structured surface morphology was observed by scanning electron microscope. With following Ti/Au metallization, the metal-semiconductor-metal (MSM) device was formed. With ultra violate (UV) light illumination come from the mercury lamp with a short pass filter, the device resistance variation under oxygen atmosphere was investigated. The reduction of detection response time and recovery time for this device with UV light illumination were observed also. After discussion based on the grain boundary connected model, the observed resistance variation controlled by the nano texture was realized. The UV light illumination technology shows an effective method to enhance the gas detection response time for this ZnO MSM gas sensor. Keywords: ZnO, MSM,en_US
dc.language.isoen_USen_US
dc.subjectZnOen_US
dc.subjectMSMen_US
dc.subjectgas sensoren_US
dc.titleEffects of UV illumination on oxygen detection for ZnO film prepared by thermally oxidized Zn on sapphire substrateen_US
dc.typeProceedings Paperen_US
dc.identifier.journalINNOVATION, COMMUNICATION AND ENGINEERINGen_US
dc.citation.spage27en_US
dc.citation.epage29en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:000337300500007-
Appears in Collections:Conferences Paper