完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Chen, Chun-Yu | en_US |
dc.contributor.author | Chang, Kuo-Chi | en_US |
dc.contributor.author | Huang, Chi-Hung | en_US |
dc.contributor.author | Lu, Chih-Cheng | en_US |
dc.date.accessioned | 2014-12-08T15:36:24Z | - |
dc.date.available | 2014-12-08T15:36:24Z | - |
dc.date.issued | 2014-05-01 | en_US |
dc.identifier.issn | 0950-4230 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1016/j.jlp.2014.01.004 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/24728 | - |
dc.description.abstract | The photoelectric, semiconductor and other high-tech industries are Taiwan\'s most important economic activities. High-tech plant incidents are caused by hazardous energy, even when that energy is confined to the inside of the process machine. During daily maintenance procedures, overhauling or troubleshooting, engineers entering the interior of the machines are in direct contact with the source of the energy or hazardous substances, which can cause serious injury. The best method for preventing such incidents is to use inherently safer design strategies (ISDs); this approach can fully eliminate the dangers from the sources of hazardous energy at a facility. This study first conducts a lithography process hazard analysis and compiles a statistical analysis of the causes of the fires and losses at high-tech plants in Taiwan since 1996, the aim being to establish the necessary improvement measures by using the Fire Dynamics Simulation (FDS) to solve relevant problems. The researchers also investigate the lithography process machine in order to explore carriage improvement measures, and analyse the fires\' causes and reactive materials hazardous properties, from 1996 to 2012. The effective improvement measures are established based on the accident statistics. The study site is a 300 mm wafer fabrication plant located in Hsinchu Science Park, Taiwan. After the completion of the annual maintenance jobs improvement from September 2011 to December 2012, the number of lithography process accidents was reduced from 6 to 1. The accident rate was significantly reduced and there were no staff time losses for a continuous 6882 h. It is confirmed that the plant safety level has been effectively enhanced. The researchers offer safety design recommendations regarding transport process appliances, chemical storage tanks, fume cupboard devices, chemical rooms, pumping equipment, transportation pipelines, valve manual box (VMB) process machines and liquid waste discharge lines. These recommendations can be applied in these industries to enhance the safety level of high-tech plants, facilities or process systems. (c) 2014 Elsevier Ltd. All rights reserved. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | Inherently safer design (ISD) | en_US |
dc.subject | Photolithography | en_US |
dc.subject | Failure mode & effective analysis (FMEA) | en_US |
dc.subject | Fire dynamics simulation (FDS) | en_US |
dc.subject | Chemical supply system | en_US |
dc.title | Study of chemical supply system of high-tech process using inherently safer design strategies in Taiwan | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1016/j.jlp.2014.01.004 | en_US |
dc.identifier.journal | JOURNAL OF LOSS PREVENTION IN THE PROCESS INDUSTRIES | en_US |
dc.citation.volume | 29 | en_US |
dc.citation.issue | en_US | |
dc.citation.spage | 72 | en_US |
dc.citation.epage | 84 | en_US |
dc.contributor.department | 工學院 | zh_TW |
dc.contributor.department | College of Engineering | en_US |
dc.identifier.wosnumber | WOS:000337654300010 | - |
dc.citation.woscount | 0 | - |
顯示於類別: | 期刊論文 |