標題: Influence of Oxygen Concentration on Self-Compliance RRAM in Indium Oxide Film
作者: Yang, Jyun-Bao
Chang, Ting-Chang
Huang, Jheng-Jie
Chen, Yu-Ting
Tseng, Hsueh-Chih
Chu, Ann-Kuo
Sze, Simon M.
Tsai, Ming-Jinn
Zheng, Jin-Cheng
Bao, Ding-Hua
交大名義發表
電子工程學系及電子研究所
National Chiao Tung University
Department of Electronics Engineering and Institute of Electronics
關鍵字: RRAM;nonvolatile resistance switching memory;indium oxide
公開日期: 1-九月-2014
摘要: This letter investigates various oxygen concentrations in indium oxide films which induce different resistance switching behaviors, including two self-compliance behaviors and a two-step set process. The accumulated oxygen ions produce an oxygen-rich indium oxide film, which can be considered as a variable series resistor after the forming process. Analyses indicate that the lower self-compliance current can be attributed to this larger variable series resistor from the additional oxygen ions. The more significant oxidation reaction decreases the current of the high resistance state. Hence, power consumption can be reduced effectively.
URI: http://dx.doi.org/10.1109/LED.2014.2336676
http://hdl.handle.net/11536/25201
ISSN: 0741-3106
DOI: 10.1109/LED.2014.2336676
期刊: IEEE ELECTRON DEVICE LETTERS
Volume: 35
Issue: 9
起始頁: 909
結束頁: 911
顯示於類別:期刊論文


文件中的檔案:

  1. 000341574200006.pdf

若為 zip 檔案,請下載檔案解壓縮後,用瀏覽器開啟資料夾中的 index.html 瀏覽全文。