標題: | Influence of Oxygen Concentration on Self-Compliance RRAM in Indium Oxide Film |
作者: | Yang, Jyun-Bao Chang, Ting-Chang Huang, Jheng-Jie Chen, Yu-Ting Tseng, Hsueh-Chih Chu, Ann-Kuo Sze, Simon M. Tsai, Ming-Jinn Zheng, Jin-Cheng Bao, Ding-Hua 交大名義發表 電子工程學系及電子研究所 National Chiao Tung University Department of Electronics Engineering and Institute of Electronics |
關鍵字: | RRAM;nonvolatile resistance switching memory;indium oxide |
公開日期: | 1-Sep-2014 |
摘要: | This letter investigates various oxygen concentrations in indium oxide films which induce different resistance switching behaviors, including two self-compliance behaviors and a two-step set process. The accumulated oxygen ions produce an oxygen-rich indium oxide film, which can be considered as a variable series resistor after the forming process. Analyses indicate that the lower self-compliance current can be attributed to this larger variable series resistor from the additional oxygen ions. The more significant oxidation reaction decreases the current of the high resistance state. Hence, power consumption can be reduced effectively. |
URI: | http://dx.doi.org/10.1109/LED.2014.2336676 http://hdl.handle.net/11536/25201 |
ISSN: | 0741-3106 |
DOI: | 10.1109/LED.2014.2336676 |
期刊: | IEEE ELECTRON DEVICE LETTERS |
Volume: | 35 |
Issue: | 9 |
起始頁: | 909 |
結束頁: | 911 |
Appears in Collections: | Articles |
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