標題: | Self-assembled GaAs antidots growth in InAs matrix on (100) InAs substrate |
作者: | Lin, SD Lee, CP 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
關鍵字: | antidots;self-assembled growth;GaAs/InAs;InAs substrate;transition thickness |
公開日期: | 1-一月-2005 |
摘要: | We have grown GaAs antidots in InAs matrix on (10 0) InAs substrate successfully. The quantum-sized 3-D islands were observed clearly in both AFM and TEM measurements. From these observations, the 2-D to 3-D transition thickness is determined to be between 2.25 and 2.5 ML. For 2.5 ML GaAs deposition, the grown antidots have a size of about 15-35 nm in base diameter and about 2-4 run in height with a density about 3-4 x 10(10) cm(-2). (C) 2003 Elsevier B.V. All rights reserved. |
URI: | http://dx.doi.org/10.1016/j.physe.2003.12.126 http://hdl.handle.net/11536/25299 |
ISSN: | 1386-9477 |
DOI: | 10.1016/j.physe.2003.12.126 |
期刊: | PHYSICA E-LOW-DIMENSIONAL SYSTEMS & NANOSTRUCTURES |
Volume: | 25 |
Issue: | 4 |
起始頁: | 335 |
結束頁: | 338 |
顯示於類別: | 期刊論文 |