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dc.contributor.authorKuo, HCen_US
dc.contributor.authorYao, HHen_US
dc.contributor.authorChang, YHen_US
dc.contributor.authorChang, YAen_US
dc.contributor.authorTsai, MYen_US
dc.contributor.authorHsieh, Jen_US
dc.contributor.authorChang, EYen_US
dc.contributor.authorWang, SCen_US
dc.date.accessioned2014-12-08T15:37:10Z-
dc.date.available2014-12-08T15:37:10Z-
dc.date.issued2004-12-10en_US
dc.identifier.issn0022-0248en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.jcrysgro.2004.08.092en_US
dc.identifier.urihttp://hdl.handle.net/11536/25552-
dc.description.abstract1.27mum InGaAs:Sb-GaAs-GaAsP vertical cavity surface-emitting lasers (VCSELs) were grown by metalorganic chemical vapor deposition (MOCVD) with superior performance. The threshold current changes between 1.8 and 1.1 mA and the slope efficiency drops below similar to35% when the temperature is raised from room temperature to 70degreesC. With only 5 mA of bias current, the 3 dB modulation frequency response is measured to be 8.36 GHz which is suitable for 10Gb/s operation. The maximal bandwidth is estimated to 10.7GHz with modulation current efficiency factor MCEF) of similar to5.25GHz/(mA)(1/2). The results of InGaAs:Sb-GaAs-GaAsP VCSELs can reach a performance level comparable to GalnAsN VCSELs with better thermal stability and should be considered as a very promising candidate for 1.3 mum commercial applications. (C) 2004 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectmetalorganic chemical vapor depositionen_US
dc.subjectantimonidesen_US
dc.subjectsemiconducting indium compoundsen_US
dc.subjectoptical fiber devicesen_US
dc.subjectvertical cavity surface emitting laseren_US
dc.titleMOCVD growth of highly strained InGaAs : Sb-GaAs-GaAsP quantum well vertical cavity surface-emitting lasers with 1.27 mu m emissionen_US
dc.typeArticle; Proceedings Paperen_US
dc.identifier.doi10.1016/j.jcrysgro.2004.08.092en_US
dc.identifier.journalJOURNAL OF CRYSTAL GROWTHen_US
dc.citation.volume272en_US
dc.citation.issue1-4en_US
dc.citation.spage538en_US
dc.citation.epage542en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000225890300086-
Appears in Collections:Conferences Paper


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