Improving spin-coating process using altered cover design

標題:	Improving spin-coating process using altered cover design
作者:	Cheng, CM Chen, RH 機械工程學系 Department of Mechanical Engineering
關鍵字:	thick-film photoresist;spin coating;work chamber cover
公開日期:	1-Dec-2004
摘要:	A novel work chamber cover design for a spin coater that can reduce the effect of airflow on spin coating is presented. The experimental results reveal that superior uniformity and film area can be obtained by utilizing the modified design instead of the conventional design.
URI:	http://dx.doi.org/10.1143/JJAP.43.8028 http://hdl.handle.net/11536/25577
ISSN:	0021-4922
DOI:	10.1143/JJAP.43.8028
期刊:	JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
Volume:	43
Issue:	12
起始頁:	8028
結束頁:	8029
Appears in Collections:	Articles

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