標題: Single mode 1.3 mu m InGaAsN/GaAs quantum well vertical cavity surface emitting lasers grown by molecular beam epitaxy
作者: Hsiao, RS
Wang, JS
Lin, KF
Wei, L
Liu, HY
Liang, CY
Lai, CM
Kovsh, AR
Maleev, NA
Chi, JY
Chen, JF
電子物理學系
Department of Electrophysics
關鍵字: InGaAsN/GaAs quantum wells;vertical cavity surface emitting lasers;molecular beam epitaxy
公開日期: 1-Dec-2004
摘要: The growth by molecular-beam-epitaxy of high-quality 1.3 mum InGaAsN/GaAs quantum wells (QW) intra-cavity contacted vertical cavity surface emitting lasers (VCSELs) was demonstrated. Low-temperature growth, which suppresses the phase separation significantly improves material quality in the active region. Room-temperature continuous wave (RT-CW) single mode output power of 0.75 mW with an initial slope efficiency of 0.17 W/A and a side mode suppression ratio of 40 dB at a lasing wavelength of as long as 1304 nm were obtained.
URI: http://dx.doi.org/10.1143/JJAP.43.L1555
http://hdl.handle.net/11536/25584
ISSN: 0021-4922
DOI: 10.1143/JJAP.43.L1555
期刊: JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS
Volume: 43
Issue: 12A
起始頁: L1555
結束頁: L1557
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