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dc.contributor.authorChen, PLen_US
dc.contributor.authorChang, JKen_US
dc.contributor.authorKuo, CTen_US
dc.contributor.authorPan, FMen_US
dc.date.accessioned2014-12-08T15:37:25Z-
dc.date.available2014-12-08T15:37:25Z-
dc.date.issued2004-11-01en_US
dc.identifier.issn0925-9635en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.diamond.2004.05.007en_US
dc.identifier.urihttp://hdl.handle.net/11536/25737-
dc.description.abstractHighly aligned carbon nanorubes (CNTs) have been successfully grown in vertical channels of the anodic aluminum oxide (AAO) template by microwave plasma electron cyclotron resonance chemical vapor deposition (ECR-CVD). Nanoporous AAO templates with hexagonal pore pattern were prepared by the two-step anodization of A] films. Following the electroplating of Co catalyst into the pore bottom, multiwalled CNTs were synthesized in the ECR-CVD system using a gas mixture of CH4 and H-2. The microstructure of the CNTs was studied by scanning electron microscopy (SEM) and transmission electron microscopy (TEM). The CNTs with a very high packing density and a uniform size distribution are well graphitized, and Co particles embedded at their tips implies the tip growth mechanism. The segments of CNTs stretching out of the AAO nanopores still maintain relatively good alignment, and have a very slow growth rate, which allows us to obtain reproducible tube length by tuning the growth time. Field emission measurements of the CNTs showed derivable electron emission properties, attributed to their uniformity in size, good alignment, and good graphitization properties. (C) 2004 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectnanotubesen_US
dc.subjectgraphiteen_US
dc.subjectplasma CVDen_US
dc.subjectfield emissionen_US
dc.titleAnodic aluminum oxide template assisted growth of vertically aligned carbon nanotube arrays by ECR-CVDen_US
dc.typeArticle; Proceedings Paperen_US
dc.identifier.doi10.1016/j.diamond.2004.05.007en_US
dc.identifier.journalDIAMOND AND RELATED MATERIALSen_US
dc.citation.volume13en_US
dc.citation.issue11-12en_US
dc.citation.spage1949en_US
dc.citation.epage1953en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000225057300004-
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