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dc.contributor.authorHuang, H. W.en_US
dc.contributor.authorLai, Fang-Ien_US
dc.contributor.authorKuo, S. Y.en_US
dc.contributor.authorHuang, J. K.en_US
dc.contributor.authorLee, K. Y.en_US
dc.date.accessioned2014-12-08T15:37:34Z-
dc.date.available2014-12-08T15:37:34Z-
dc.date.issued2011-02-01en_US
dc.identifier.issn0038-1101en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.sse.2010.10.003en_US
dc.identifier.urihttp://hdl.handle.net/11536/25833-
dc.description.abstractGaN-based LEDs with photonic crystal (PhC) patterns on an n- and a p-GaN layer by nano-imprint lithography (NIL) are fabricated and investigated. At a driving current of 20 mA on Transistor Outline (TO)-can package, the light output power of the GaN-based LED with PhC patterns on an n- and a p-GaN layer is enhanced by a factor of 1.30, and the wall-plug efficiency is increased by 24%. In addition, the higher output power of the LED with PhC patterns on the n- and p-GaN layer is due to better crystal quality on n-GaN and higher scattering effect on p-GaN surface using PhC pattern structure. (C) 2010 Elsevier Ltd. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectGallium Nitride (GaN)en_US
dc.subjectLight-emitting diodes (LEDs)en_US
dc.subjectPhotonic Crystal (PhC)en_US
dc.titleInvestigation of GaN-based light-emitting diodes using double photonic crystal patternsen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.sse.2010.10.003en_US
dc.identifier.journalSOLID-STATE ELECTRONICSen_US
dc.citation.volume56en_US
dc.citation.issue1en_US
dc.citation.spage31en_US
dc.citation.epage34en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000287272000006-
dc.citation.woscount1-
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