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dc.contributor.authorWang, C. H.en_US
dc.contributor.authorKe, C. C.en_US
dc.contributor.authorLee, C. Y.en_US
dc.contributor.authorChang, S. P.en_US
dc.contributor.authorChang, W. T.en_US
dc.contributor.authorLi, J. C.en_US
dc.contributor.authorLi, Z. Y.en_US
dc.contributor.authorYang, H. C.en_US
dc.contributor.authorKuo, H. C.en_US
dc.contributor.authorLu, T. C.en_US
dc.contributor.authorWang, S. C.en_US
dc.date.accessioned2014-12-08T15:38:13Z-
dc.date.available2014-12-08T15:38:13Z-
dc.date.issued2010-12-27en_US
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.3531753en_US
dc.identifier.urihttp://hdl.handle.net/11536/26206-
dc.description.abstractA graded-composition electron blocking layer (GEBL) with aluminum composition increasing along the [0001] direction was designed for c-plane InGaN/GaN light-emitting diodes (LEDs) by employing the band-engineering. The simulation results demonstrated that such GEBL can effectively enhance the capability of hole transportation across the EBL as well as the electron confinement. Consequently, the LED with GEBL grown by metal-organic chemical vapor deposition exhibited lower forward voltage and series resistance and much higher output power at high current density as compared to conventional LED. Meanwhile, the efficiency droop was reduced from 34% in conventional LED to only 4% from the maximum value at low injection current to 200 A/cm(2). (C) 2010 American Institute of Physics. [doi:10.1063/1.3531753]en_US
dc.language.isoen_USen_US
dc.titleHole injection and efficiency droop improvement in InGaN/GaN light-emitting diodes by band-engineered electron blocking layeren_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.3531753en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.citation.volume97en_US
dc.citation.issue26en_US
dc.citation.epageen_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000285768100003-
dc.citation.woscount74-
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