完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Ou, Po-Chi | en_US |
dc.contributor.author | Lin, Ja-Hon | en_US |
dc.contributor.author | Chang, Chi-An | en_US |
dc.contributor.author | Liu, Wei-Rein | en_US |
dc.contributor.author | Hsieh, Wen-Feng | en_US |
dc.date.accessioned | 2014-12-08T15:38:17Z | - |
dc.date.available | 2014-12-08T15:38:17Z | - |
dc.date.issued | 2010-12-15 | en_US |
dc.identifier.issn | 0022-3727 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1088/0022-3727/43/49/495103 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/26224 | - |
dc.description.abstract | Energy-dependent free-carrier dynamics was investigated in 70 nm (thin) and 1 mu m (thick) ZnO epifilms using the optical pump-probe technique. The far-above-band-gap dynamics in the thin epifilm reveals the prolonged relaxation and the slow recovery of renormalized band gap. The band-gap renormalization (BGR) effect is affected by the inefficient carrier-phonon scattering. In addition, the loss of excited carrier density via surface trapping results in an energy-dependent BGR buildup time. However, the far-above-band-gap dynamics in the thick epifilm reveals fast relaxation followed by BGR recovery, which is independent of the photon energy. The near-band-gap dynamics shows an ultrafast carrier thermalization both in the thin and the thick epifilms. | en_US |
dc.language.iso | en_US | en_US |
dc.title | Thickness effect on ultrafast thermalization of carriers in above-band-gap states in ZnO epitaxial films | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1088/0022-3727/43/49/495103 | en_US |
dc.identifier.journal | JOURNAL OF PHYSICS D-APPLIED PHYSICS | en_US |
dc.citation.volume | 43 | en_US |
dc.citation.issue | 49 | en_US |
dc.citation.epage | en_US | |
dc.contributor.department | 光電工程學系 | zh_TW |
dc.contributor.department | Department of Photonics | en_US |
dc.identifier.wosnumber | WOS:000284606800007 | - |
dc.citation.woscount | 6 | - |
顯示於類別: | 期刊論文 |