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dc.contributor.authorLi, SYen_US
dc.contributor.authorLin, Pen_US
dc.contributor.authorLee, CYen_US
dc.contributor.authorTseng, TYen_US
dc.contributor.authorHuang, CJen_US
dc.date.accessioned2014-12-08T15:38:40Z-
dc.date.available2014-12-08T15:38:40Z-
dc.date.issued2004-08-21en_US
dc.identifier.issn0022-3727en_US
dc.identifier.urihttp://dx.doi.org/10.1088/0022-3727/37/16/009en_US
dc.identifier.urihttp://hdl.handle.net/11536/26461-
dc.description.abstractSri doped ZnO (SZO) nanowires were fabricated by a vapour-liquid-solid growth process. The reaction temperature for the formation of the nanowires can be reduced to similar to100degreesC due to Sri doping. The growth direction and morphology of SZO nanowires depend on the amount of Sn, which is attributed to the difference in sizes between Zn and Sri atoms. The ultraviolet emission of SZO nanowires varies from 380 to 396 nm since Sri acts as a doubly ionized donor and introduces deep states in the band gap. In addition, the SZO nanowires exhibit significantly Improved field emission characteristics with a turn-on electric field of 0.05 V mum(-1) under a current density of 0.5 mA cm(-2) in comparison with undoped ZnO nanowires. The work function of the SZO nanowire decreases for higher carrier concentrations and the field enhancement factor increases for smaller diameters. Also, the resistance of the SZO nanowire is decreased for the higher Sri mole fraction. Therefore, it is expected that SZO nanowires can be applied in nano-lasers and flat panel displays in the future.en_US
dc.language.isoen_USen_US
dc.titleEffect of Sn dopant on the properties of ZnO nanowiresen_US
dc.typeArticleen_US
dc.identifier.doi10.1088/0022-3727/37/16/009en_US
dc.identifier.journalJOURNAL OF PHYSICS D-APPLIED PHYSICSen_US
dc.citation.volume37en_US
dc.citation.issue16en_US
dc.citation.spage2274en_US
dc.citation.epage2282en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000223941100010-
dc.citation.woscount61-
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