標題: | Study of Ti/W/Cu, Ti/Co/Cu, and Ti/Mo/Cu multilayer structures as Schottky metals for GaAs diodes |
作者: | Chang, HC Lee, CS Chen, SH Chang, EY He, J 材料科學與工程學系 友訊交大聯合研發中心 Department of Materials Science and Engineering D Link NCTU Joint Res Ctr |
關鍵字: | Schottky;diffusion barrier;GaAs |
公開日期: | 1-Jul-2004 |
摘要: | Schottky structures with copper and refractory metals as diffusion barrier for GaAs Schottky diodes were evaluated. These structures have lower series resistances than the conventionally used Ti/Pt/Au structure. Based on the electrical and material characteristics, the Ti/W/Cu and Ti/Mo/Cu Schottky structures are thermally stable up to 400degreesC; the Ti/Co/Cu Schottky structure is thermally stable up to 300degreesC. Overall, the copper-metallized Schottky structures have excellent electrical characteristics and thermal stability, and can be used as the Schottky metals for GaAs devices. |
URI: | http://dx.doi.org/10.1007/s11664-004-0251-2 http://hdl.handle.net/11536/26608 |
ISSN: | 0361-5235 |
DOI: | 10.1007/s11664-004-0251-2 |
期刊: | JOURNAL OF ELECTRONIC MATERIALS |
Volume: | 33 |
Issue: | 7 |
起始頁: | L15 |
結束頁: | L17 |
Appears in Collections: | Articles |
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