標題: | Composite-channel metamorphic high electron mobility transistor for low-noise and high-linearity applications |
作者: | Chang, EY Lin, YC Chen, GJ Lee, HM Huang, GW Biswas, D Chang, CY 材料科學與工程學系 電子工程學系及電子研究所 友訊交大聯合研發中心 Department of Materials Science and Engineering Department of Electronics Engineering and Institute of Electronics D Link NCTU Joint Res Ctr |
關鍵字: | MHEMT;composite channel;high linearity;low noise;IP3 |
公開日期: | 1-Jul-2004 |
摘要: | A metamorphic high-electron-mobility transistor (MHEMT) with In0.55Ga0.45As/In0.67Ga0.33As/In0.55Ga0.45As composite channel layers was developed for low-noise and high-linearity applications. The use of: a composite channel results in high electron mobility and good confinement of electrons in the channel region which are the desired characteristics of low-noise and high-linearity devices. The noise figure of the 0.25 x 160 mum(2) devices is 0.23 dB with 15.06 dB associated gain, and the output third-order intercept point (IP3) is 18.67 dBm at 6 GHz. The device shows great potential for high-linearity and low-noise applications at high frequencies. |
URI: | http://dx.doi.org/10.1143/JJAP.43.L871 http://hdl.handle.net/11536/26651 |
ISSN: | 0021-4922 |
DOI: | 10.1143/JJAP.43.L871 |
期刊: | JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS |
Volume: | 43 |
Issue: | 7A |
起始頁: | L871 |
結束頁: | L872 |
Appears in Collections: | Articles |
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