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dc.contributor.authorPeng, YCSen_US
dc.contributor.authorWu, YSen_US
dc.date.accessioned2014-12-08T15:39:27Z-
dc.date.available2014-12-08T15:39:27Z-
dc.date.issued2004-03-15en_US
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.1682696en_US
dc.identifier.urihttp://hdl.handle.net/11536/26947-
dc.description.abstractHigh-power light-emitting diodes (LEDs) fabricated on Cu substrates were investigated in this study. The AlGaInP LED structure was bonded to a Cu substrate by using indium-tin-oxide as the diffusion barrier layer. It was found that Cu-substrate-bonded LED devices could be operated in a much higher injection forward current, 800 mA, which was eight times higher than that used in traditional GaAs-substrate LEDs. The luminous intensity of the Cu-substrate LEDs could reach as high as 1230 mcd, which was three times higher than that of the GaAs-substrate LEDs. (C) 2004 American Institute of Physics.en_US
dc.language.isoen_USen_US
dc.titleHigh-power AlGaInP light-emitting diodes with metal substrates fabricated by wafer bondingen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.1682696en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.citation.volume84en_US
dc.citation.issue11en_US
dc.citation.spage1841en_US
dc.citation.epage1843en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000220182600009-
dc.citation.woscount9-
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