Thermally activated diffusion observed by in situ reflection high energy electron diffraction intensity monitoring on interrupted SrTiO3 homoepitaxial growth

標題:	Thermally activated diffusion observed by in situ reflection high energy electron diffraction intensity monitoring on interrupted SrTiO3 homoepitaxial growth
作者:	Wang, TC Juang, JY Wu, KH Uen, TM Gou, YS 電子物理學系 Department of Electrophysics
關鍵字:	RHEED;activation energy;reflection high energy electron diffraction;diffusion;activation energy;kinetics
公開日期:	1-二月-2004
摘要:	The reflection high energy electron diffraction (RHEED) intensity is reported following a quadratic power law dependence on annealing time for interrupted laser ablation-grown strontium titanate films. The activation energy of 1.0eV can further be obtained from the diffusion Arrhenius plot by assuming a direct proportionality between the RHEED intensity and the diffusion length.
URI:	http://hdl.handle.net/11536/27058
ISSN:	0021-4922
期刊:	JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
Volume:	43
Issue:	2
起始頁:	771
結束頁:	772
顯示於類別：	期刊論文

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