標題: | Thermally activated diffusion observed by in situ reflection high energy electron diffraction intensity monitoring on interrupted SrTiO3 homoepitaxial growth |
作者: | Wang, TC Juang, JY Wu, KH Uen, TM Gou, YS 電子物理學系 Department of Electrophysics |
關鍵字: | RHEED;activation energy;reflection high energy electron diffraction;diffusion;activation energy;kinetics |
公開日期: | 1-Feb-2004 |
摘要: | The reflection high energy electron diffraction (RHEED) intensity is reported following a quadratic power law dependence on annealing time for interrupted laser ablation-grown strontium titanate films. The activation energy of 1.0eV can further be obtained from the diffusion Arrhenius plot by assuming a direct proportionality between the RHEED intensity and the diffusion length. |
URI: | http://hdl.handle.net/11536/27058 |
ISSN: | 0021-4922 |
期刊: | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS |
Volume: | 43 |
Issue: | 2 |
起始頁: | 771 |
結束頁: | 772 |
Appears in Collections: | Articles |
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