標題: Thermally activated diffusion observed by in situ reflection high energy electron diffraction intensity monitoring on interrupted SrTiO3 homoepitaxial growth
作者: Wang, TC
Juang, JY
Wu, KH
Uen, TM
Gou, YS
電子物理學系
Department of Electrophysics
關鍵字: RHEED;activation energy;reflection high energy electron diffraction;diffusion;activation energy;kinetics
公開日期: 1-Feb-2004
摘要: The reflection high energy electron diffraction (RHEED) intensity is reported following a quadratic power law dependence on annealing time for interrupted laser ablation-grown strontium titanate films. The activation energy of 1.0eV can further be obtained from the diffusion Arrhenius plot by assuming a direct proportionality between the RHEED intensity and the diffusion length.
URI: http://hdl.handle.net/11536/27058
ISSN: 0021-4922
期刊: JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
Volume: 43
Issue: 2
起始頁: 771
結束頁: 772
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