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dc.contributor.authorKuo, HCen_US
dc.contributor.authorChang, YSen_US
dc.contributor.authorLin, CFen_US
dc.contributor.authorLu, TCen_US
dc.contributor.authorWang, SCen_US
dc.date.accessioned2014-12-08T15:39:44Z-
dc.date.available2014-12-08T15:39:44Z-
dc.date.issued2004-01-19en_US
dc.identifier.issn0022-0248en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.jcrysgro.2003.11.027en_US
dc.identifier.urihttp://hdl.handle.net/11536/27130-
dc.description.abstractWe present in this paper the metalorganic chemical vapor deposition growth and characterization of high-performance 850 nm InGaAsP/InGaP strain-compensated MQWs vertical-cavity surface-emitting lasers (VCSELs). The InGaAsP/InGaP MQWs growth condition was optimized using photoluminescence. These VCSELs exhibit superior characteristics, with threshold currents similar to 0.4 mA, and slope efficiencies similar to 0.6 mW/mA. The threshold current change is less than 0.2 mA and the slope efficiency drops by less than similar to 30% when the substrate temperature is raised from room temperature to 85degreesC. These VCSELs also demonstrate high-speed modulation bandwidth up to 12.5 Gbit/s from 25degreesC to 85degreesC. (C) 2003 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectcharacterizationen_US
dc.subjectmetalorganic chemical vapor depositionen_US
dc.subjectsemiconducting gallium arsenideen_US
dc.subjectsemiconducting quaternary alloysen_US
dc.subjectlaser diodesen_US
dc.subjectoptical fiber devicesen_US
dc.titleMOCVD growth of high-performance InGaAsP/InGaP strain-compensated VCSELs with 850 nm emission wavelengthen_US
dc.typeArticle; Proceedings Paperen_US
dc.identifier.doi10.1016/j.jcrysgro.2003.11.027en_US
dc.identifier.journalJOURNAL OF CRYSTAL GROWTHen_US
dc.citation.volume261en_US
dc.citation.issue2-3en_US
dc.citation.spage355en_US
dc.citation.epage358en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000188500000030-
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