完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Lan, BC | en_US |
dc.contributor.author | Huang, CY | en_US |
dc.contributor.author | Chen, SY | en_US |
dc.date.accessioned | 2014-12-08T15:40:06Z | - |
dc.date.available | 2014-12-08T15:40:06Z | - |
dc.date.issued | 2003-11-15 | en_US |
dc.identifier.issn | 0021-8979 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1063/1.1621716 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/27390 | - |
dc.description.abstract | Bismuth-containing layered perovskite Sr0.8Bi2+xTa2O9 (SBT) thin films with x=0-0.8 were prepared to investigate annealing temperature effect, especially at high temperature, on physical characteristics and electrical properties of SBT films on Al2O3 (10 nm)/Si. At 800 degreesC, the Sr0.8Bi2Ta2+xO9/Al2O3/Si exhibits ferroelectric mode and the width of memory window decreases with the increase of Bi content that is dependent on the effective coercive field. However, at a higher annealing temperature of 900 degreesC, a larger ferroelectric memory window was obtained for Bi-rich Sr0.8Bi2+xTa2O9 (x=0.4 or 0.8) films compared to SBT film (x=0) that should be related to the reduced leakage current due to the formation of rod-shape grains and amorphous SBT composite layer. The leakage current of Sr0.8Bi2.4Ta2O9/Al2O3/Si annealed at 900 degreesC is about 1.2x10(-9) A/cm(2) that has two orders of magnitude lower than that of 800 degreesC-annealed SBT films measured at -100 kV/cm. However, the Sr0.8Bi2Ta2O9 (x=0) film on Al2O3/Si capacitor shows no obvious change with the increase of annealing temperature. (C) 2003 American Institute of Physics. | en_US |
dc.language.iso | en_US | en_US |
dc.title | Physical characteristics and electrical properties of Sr0.8Bi2+xTa2O9 films on Al2O3/Si annealed at high temperature | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1063/1.1621716 | en_US |
dc.identifier.journal | JOURNAL OF APPLIED PHYSICS | en_US |
dc.citation.volume | 94 | en_US |
dc.citation.issue | 10 | en_US |
dc.citation.spage | 6735 | en_US |
dc.citation.epage | 6740 | en_US |
dc.contributor.department | 材料科學與工程學系 | zh_TW |
dc.contributor.department | Department of Materials Science and Engineering | en_US |
dc.identifier.wosnumber | WOS:000186276600078 | - |
dc.citation.woscount | 13 | - |
顯示於類別: | 期刊論文 |