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dc.contributor.authorHsu, CYen_US
dc.contributor.authorLan, WHen_US
dc.contributor.authorWu, YSen_US
dc.date.accessioned2014-12-08T15:40:18Z-
dc.date.available2014-12-08T15:40:18Z-
dc.date.issued2003-09-22en_US
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.1601306en_US
dc.identifier.urihttp://hdl.handle.net/11536/27523-
dc.description.abstractThe effect of thermal annealing on current-voltage properties of GaN light emitting diodes (LEDs) has been studied. At annealing temperatures above 700 degreesC, the p-n junction of the diodes became very leaky and Ga-contained metallic bubbles were observed on the surface of Ni/Au p-ohmic contact. Transmission electron microscopy and energy dispersive x-ray spectrometer studies revealed that these metallic bubbles resided directly on top of the threading dislocations in GaN and both Ni and Au were indiffused into the LED structure along the cores of the TDs. The conducting paths formed by the metal containing dislocation cores are believed to be the cause for the observed short circuit behavior of p-n junctions at high annealing temperatures. (C) 2003 American Institute of Physics.en_US
dc.language.isoen_USen_US
dc.titleEffect of thermal annealing of Ni/Au ohmic contact on the leakage current of GaN based light emitting diodesen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.1601306en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.citation.volume83en_US
dc.citation.issue12en_US
dc.citation.spage2447en_US
dc.citation.epage2449en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000185333200049-
dc.citation.woscount47-
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