標題: Cost-effective fabrication of a phase mask by direct etching of the laser-interference grating on fused silica substrate
作者: Lu, YT
Chen, YH
Chi, S
光電工程學系
Department of Photonics
關鍵字: phase mask;laser-interference grating;fiber grating
公開日期: 5-Sep-2003
摘要: A simple and cost-effective method to manufacture a phase mask with high diffraction efficiency for deep UV application is proposed. The deep rectangular grating fabricated by using laser interference is etched directly into a fused silica substrate, instead of the dielectric coating on a substrate (done in a previous method). Using the metal layer on a dielectric layer for masking in the deep, dry etching process is also unnecessary in our technique. A fabricated rectangular grating with high diffraction efficiency is presented in this paper. We also demonstrate the fabrication processes and show the optimum parameters for our proposed technology. (C) 2003 Wiley Periodicals, Inc.
URI: http://dx.doi.org/10.1002/mop.11061
http://hdl.handle.net/11536/27538
ISSN: 0895-2477
DOI: 10.1002/mop.11061
期刊: MICROWAVE AND OPTICAL TECHNOLOGY LETTERS
Volume: 38
Issue: 5
起始頁: 362
結束頁: 365
Appears in Collections:Articles


Files in This Item:

  1. 000184437400006.pdf

If it is a zip file, please download the file and unzip it, then open index.html in a browser to view the full text content.