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dc.contributor.authorChan, KTen_US
dc.contributor.authorChin, Aen_US
dc.contributor.authorLi, MFen_US
dc.contributor.authorKwong, DLen_US
dc.contributor.authorMcAlister, SPen_US
dc.contributor.authorDuh, DSen_US
dc.contributor.authorLin, WJen_US
dc.contributor.authorChang, CYen_US
dc.date.accessioned2014-12-08T15:40:20Z-
dc.date.available2014-12-08T15:40:20Z-
dc.date.issued2003-09-01en_US
dc.identifier.issn0018-9480en_US
dc.identifier.urihttp://dx.doi.org/10.1109/TMTT.2003.815890en_US
dc.identifier.urihttp://hdl.handle.net/11536/27542-
dc.description.abstractHigh-performance bandpass and bandstop microwave coplanar filters, which operate from 22 to 91 GHz, have been fabricated on Si substrates. This was achieved using an optimized proton implantation process that converts the standard low-resistivity (similar to10 Omega (.) cm) Si to a semi-insulating state. The bandpass filters consist of coupled lines to form a series resonator, while the bandstop filter was designed in a double-folded short-end stub structure. For the bandpass filters at 40 and 91 GHz, low insertion loss was measured, close to electromagnetic simulation values. We also fabricated excellent bandstop filters with very low transmission loss of similar to1 dB and deep band rejection at both 22 and 50 GHz. The good filter performance was confirmed by the higher substrate impedance to ground, which was extracted from the well-matched S-parameter equivalent-circuit data.en_US
dc.language.isoen_USen_US
dc.subjectbandpassen_US
dc.subjectbandstopen_US
dc.subjectfilteren_US
dc.subjectintegrationen_US
dc.subjectmillimeter waveen_US
dc.subjectSien_US
dc.titleHigh-performance microwave coplanar bandpass and bandstop filters on Si substratesen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/TMTT.2003.815890en_US
dc.identifier.journalIEEE TRANSACTIONS ON MICROWAVE THEORY AND TECHNIQUESen_US
dc.citation.volume51en_US
dc.citation.issue9en_US
dc.citation.spage2036en_US
dc.citation.epage2040en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.department電信工程研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.contributor.departmentInstitute of Communications Engineeringen_US
dc.identifier.wosnumberWOS:000184789400008-
dc.citation.woscount12-
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