Title: | A parallel coupled-line filter using VLSI backend interconnect with high resistivity substrate |
Authors: | Chen, C. C. Kao, H. L. Chiang, K. C. Chin, Albert 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
Keywords: | parallel coupled-line filter;VLSI;high resistivity substrate;millimeter-wave |
Issue Date: | 1-Jan-2006 |
Abstract: | This paper reports our progress in developing parallel coupled-line filters based on Si-based VLSI backend interconnects for millimeter-wave applications. The resonant frequency of this coupled-line filter increases with increasing spacing-gap and with increasing IDM thickness. By using high resistivity substrate, the parallel coupled-line band-pass filter is extremely effective in reducing substrate loss, and also provides very low insertion loss, even at the millimeter-wave regime. In addition, the parallel coupled-line filter suitable for advanced system-on-a-chips at the millimeter wave application achieves high performance characteristics, which show low insertion loss, wide band, and compatibility with standard VLSI process. |
URI: | http://dx.doi.org/10.1007/s10762-006-9051-5 http://hdl.handle.net/11536/12928 |
ISSN: | 0195-9271 |
DOI: | 10.1007/s10762-006-9051-5 |
Journal: | INTERNATIONAL JOURNAL OF INFRARED AND MILLIMETER WAVES |
Volume: | 27 |
Issue: | 1 |
Begin Page: | 93 |
End Page: | 105 |
Appears in Collections: | Articles |
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