標題: Role of interface reaction at high temperature in electrical characteristics of Bi3.25La0.75Ti3O12/Al2O3/Si capacitors
作者: Sun, CL
Chen, SY
材料科學與工程學系
Department of Materials Science and Engineering
公開日期: 1-九月-2003
摘要: A novel face-to-face annealing process was used to investigate the enhanced electrical characteristics in Bi3.25La0.75Ti3O12 (BLT)/Al2O3/Si capacitors annealed at high temperatures. The low leakage current of BLT/Al2O3/Si capacitors can be obtained after high temperature annealing and the mechanism has been clarified and attributed to the formation of Si-rich aluminum oxide. The surface composition of aluminum oxide after annealing was further analyzed by X-ray photoelectron spectrometer (XPS) and XPS spectra revealed that the aluminum oxide would react with both Si substrate and BLT thin films to form Si-rich aluminum oxide. Because the aluminum oxide has weaker bonding than that of silicon oxide, Si composition can quench the electrical defects in aluminum oxide so as to reduce the leakage current of BLT/Al2O3/Si capacitors. (C) 2003 The Electrochemical Society.
URI: http://dx.doi.org/10.1149/1.1597885
http://hdl.handle.net/11536/27579
ISSN: 0013-4651
DOI: 10.1149/1.1597885
期刊: JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Volume: 150
Issue: 9
起始頁: C600
結束頁: C602
顯示於類別:期刊論文


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