完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Shew, BY | en_US |
dc.contributor.author | Hung, JT | en_US |
dc.contributor.author | Huang, TY | en_US |
dc.contributor.author | Liu, KP | en_US |
dc.contributor.author | Chou, CP | en_US |
dc.date.accessioned | 2014-12-08T15:40:27Z | - |
dc.date.available | 2014-12-08T15:40:27Z | - |
dc.date.issued | 2003-09-01 | en_US |
dc.identifier.issn | 0960-1317 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1088/0960-1317/13/5/324 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/27625 | - |
dc.description.abstract | This paper investigates the feasibility of using SU-8 as a high contrast x-ray resist. The SU-8 resist was irradiated with various x-ray doses and then developed for a fixed time. The developing rate was then measured and plotted versus absorbed x-ray dosage. The results revealed that SU-8 exhibited very high lithographic contrast other than elevated sensitivity. Therefore, a very thin mask absorber is required to switch the negative resist 'ON' or 'OFF'. Preliminary results showed that 1 mum wide, 17 mum thick SU-8 resists could be successfully patterned using an absorber of submicron thickness. Once the absorber thickness is effectively reduced to less than 1 mum, a high-resolution x-ray mask can be patterned simply by conventional UV lithography. An extra soft x-ray beamline was not required to increase the absorber's thickness in certain cases. The process of fabricating the membrane x-ray mask could thus be considerably simplified. X-ray micromachining may be an easy way to pattern high-resolution and high-aspect-ratio microstructures for optical and photonic applications. | en_US |
dc.language.iso | en_US | en_US |
dc.title | High resolution x-ray micromachining using SU-8 resist | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1088/0960-1317/13/5/324 | en_US |
dc.identifier.journal | JOURNAL OF MICROMECHANICS AND MICROENGINEERING | en_US |
dc.citation.volume | 13 | en_US |
dc.citation.issue | 5 | en_US |
dc.citation.spage | 708 | en_US |
dc.citation.epage | 713 | en_US |
dc.contributor.department | 機械工程學系 | zh_TW |
dc.contributor.department | Department of Mechanical Engineering | en_US |
dc.identifier.wosnumber | WOS:000185656000024 | - |
dc.citation.woscount | 11 | - |
顯示於類別: | 期刊論文 |