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dc.contributor.authorChang, Chia-Yuanen_US
dc.contributor.authorHsu, Heng-Tungen_US
dc.contributor.authorChang, Edward Yien_US
dc.contributor.authorMiyamoto, Yasuyukien_US
dc.date.accessioned2014-12-08T15:40:50Z-
dc.date.available2014-12-08T15:40:50Z-
dc.date.issued2009-04-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.48.04C094en_US
dc.identifier.urihttp://hdl.handle.net/11536/27843-
dc.description.abstractAn InAs-channel high-electron-mobility transistor (HEMT) with an 80 nm gate length for ultralow-power low-noise amplifier (LNA) applications has been fabricated and characterized on a 2-in. InP substrate. Small-signal S-parameter measurements performed on the InAs-channel HEMT at a low drain-source voltage of 0.2 V exhibited an excellent f(T) of 120 GHz and an f(max) of 157 GHz. At an extremely low level of dc power consumption of 1.2 mW, the device demonstrated an associated gain of 9.7 dB with a noise figure of less than 0.8 dB at 12 GHz. Such a device also demonstrated a higher associated gain and a lower noise figure than other InGaAs-channel HEMTs at extremely low dc power consumption. These results indicate the outstanding potential of InAs-channel HEMT technology for ultralow-power space-based radar, mobile millimeter-wave communications and handheld imager applications. (c) 2009 The Japan Society of Applied Physicsen_US
dc.language.isoen_USen_US
dc.titleInAs-Channel High-Electron-Mobility Transistors for Ultralow-Power Low Noise Amplifier Applicationsen_US
dc.typeArticle; Proceedings Paperen_US
dc.identifier.doi10.1143/JJAP.48.04C094en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICSen_US
dc.citation.volume48en_US
dc.citation.issue4en_US
dc.citation.epageen_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000265652700095-
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