標題: | The growth mechanism of micron-size V defects on the hydride vapor phase epitaxy grown undoped GaN films |
作者: | Lin, PY Wu, YCS 材料科學與工程學系 Department of Materials Science and Engineering |
關鍵字: | GaN;hydride vapor phase epitaxy;V defect;epitaxial lateral overgrowth;growth mechanism |
公開日期: | 26-五月-2003 |
摘要: | Micron-size V defects were found on the hydride vapor phase epitaxy grown GaN films. When the film thickness increased, the diameter of V defects increased, but the density of the defects decreased. The defect has six {1 1 0 1} facets, which encircle to form a concave hexagonal pyramid. Its shape is similar to that of epitaxial lateral overgrowth (ELO) GaN crystal grown on a dot-patterned GaN underlying layer. Through the analysis of the growth mechanism of ELO GaN, the growth mechanism of the V defects was investigated. (C) 2003 Elsevier Science B.V. All rights reserved. |
URI: | http://dx.doi.org/10.1016/S0254-0584(03)00109-3 http://hdl.handle.net/11536/27852 |
ISSN: | 0254-0584 |
DOI: | 10.1016/S0254-0584(03)00109-3 |
期刊: | MATERIALS CHEMISTRY AND PHYSICS |
Volume: | 80 |
Issue: | 2 |
起始頁: | 397 |
結束頁: | 400 |
顯示於類別: | 期刊論文 |