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Investigation of Cu/TaN metal gate for metal-oxide-silicon devices (vol 150, pg G22, 2003)

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2003-05-01

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10.1149/1.1566966

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http://dx.doi.org/10.1149/1.1566966
 https://ir.lib.nycu.edu.tw/handle/11536/27945

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期刊論文;;Articles

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