標題: | Investigation of Cu/TaN metal gate for metal-oxide-silicon devices (vol 150, pg G22, 2003) |
作者: | Tsui, BY Huang, CF 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
公開日期: | 1-五月-2003 |
URI: | http://dx.doi.org/10.1149/1.1566966 http://hdl.handle.net/11536/27945 |
ISSN: | 0013-4651 |
DOI: | 10.1149/1.1566966 |
期刊: | JOURNAL OF THE ELECTROCHEMICAL SOCIETY |
Volume: | 150 |
Issue: | 5 |
起始頁: | L10 |
結束頁: | L10 |
顯示於類別: | 期刊論文 |