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dc.contributor.authorLee, MZen_US
dc.contributor.authorLee, CLen_US
dc.contributor.authorLei, TFen_US
dc.date.accessioned2014-12-08T15:41:08Z-
dc.date.available2014-12-08T15:41:08Z-
dc.date.issued2003-04-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.42.2123en_US
dc.identifier.urihttp://hdl.handle.net/11536/27993-
dc.description.abstractIn this paper, we propose a novel self-alignment vertical thin-film transistor (VTFT) structure with excimer laser annealing (ELA). The ELA on source and drain decreases the process temperature, suppresses the lateral diffusion of dopants in short channel devices and increases the driving current. Furthermore, the VTFTs have high carrier mobility, compared to conventional polysilicon thin film transistors (TFTs).en_US
dc.language.isoen_USen_US
dc.subjectverticalen_US
dc.subjectTFTen_US
dc.subjectVTFTen_US
dc.subjectELA and self-alignmenten_US
dc.titleNovel vertical polysilicon thin-film transistor with excimer-laser annealingen_US
dc.typeArticle; Proceedings Paperen_US
dc.identifier.doi10.1143/JJAP.42.2123en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERSen_US
dc.citation.volume42en_US
dc.citation.issue4Ben_US
dc.citation.spage2123en_US
dc.citation.epage2126en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000183283700064-
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