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dc.contributor.authorHu, SFen_US
dc.contributor.authorWong, WZen_US
dc.contributor.authorLiu, SSen_US
dc.contributor.authorWu, YCen_US
dc.contributor.authorSung, CLen_US
dc.contributor.authorHuang, TYen_US
dc.date.accessioned2014-12-08T15:41:22Z-
dc.date.available2014-12-08T15:41:22Z-
dc.date.issued2003-02-01en_US
dc.identifier.issn0038-1098en_US
dc.identifier.urihttp://dx.doi.org/10.1016/S0038-1098(02)00807-4en_US
dc.identifier.urihttp://hdl.handle.net/11536/28136-
dc.description.abstractQuantum effects in silicon nanowires due to one-dimensional carrier confinement were observed at room temperature. Electrical transport properties were measured, on narrow thin-silicon-on-insulator wires that were defined by e-beam lithography and further narrowed and thinned down by oxidation to a final thickness of around 3 nm, and a width of 29 nm. The room temperature current-voltage characteristics of the resulting silicon nanowires are shown to exhibit a zero current state may be due to the occurrence of Coulomb blockade. (C) 2003 Elsevier Science Ltd. All rights reserveden_US
dc.language.isoen_USen_US
dc.subjectnanostructuresen_US
dc.subjectnanofabricationsen_US
dc.subjecttunnellingen_US
dc.titleRoom temperature two-terminal characteristics in silicon nanowiresen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/S0038-1098(02)00807-4en_US
dc.identifier.journalSOLID STATE COMMUNICATIONSen_US
dc.citation.volume125en_US
dc.citation.issue6en_US
dc.citation.spage351en_US
dc.citation.epage354en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000180722900012-
dc.citation.woscount11-
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