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dc.contributor.authorChen, SHen_US
dc.contributor.authorChang, Len_US
dc.contributor.authorChang, EYen_US
dc.contributor.authorWu, JWen_US
dc.contributor.authorChang, CYen_US
dc.date.accessioned2014-12-08T15:42:03Z-
dc.date.available2014-12-08T15:42:03Z-
dc.date.issued2002-08-29en_US
dc.identifier.issn0013-5194en_US
dc.identifier.urihttp://dx.doi.org/10.1049/el:20020700en_US
dc.identifier.urihttp://hdl.handle.net/11536/28573-
dc.description.abstractA 20 mm-wide enhancement-mode pseudomorphic high-electron-mobility transistor (E-PHEMT) has been developed. The device has high transconductance of 490 mS/mm, and high maximum drain current of 350 mA/mm due to the use of an Al(0.3)G(4.7)As/In0.2Ga0.8As-based structure for carrier confinement. At 1.9 GHz and 3.0 V, the E-PHEMT shows 34.1 dBm (128 mW/mm) output power with power-added efficiency (PAE) of 64.5%. At 2.4 V, the maximum saturated output power is 32.25 dBm and maximum PAE is 78.5%. The E-PHEMT demonstrates excellent power performance at 1.9 GHz and below 3 V.en_US
dc.language.isoen_USen_US
dc.titleHigh power Al0.3Ga0.7As/In0.2Ga0.8As enhancement-mode PHEMT for low-voltage wireless communication systemsen_US
dc.typeArticleen_US
dc.identifier.doi10.1049/el:20020700en_US
dc.identifier.journalELECTRONICS LETTERSen_US
dc.citation.volume38en_US
dc.citation.issue18en_US
dc.citation.spage1063en_US
dc.citation.epage1064en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.department友訊交大聯合研發中心zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.contributor.departmentD Link NCTU Joint Res Ctren_US
dc.identifier.wosnumberWOS:000178056000040-
dc.citation.woscount3-
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