Metallo-organic chemical vapor deposition of tantalum carbide and tantalum nitride thin films from (BuCH)-Bu-t=Ta(CH2 Bu-t)(3) and (BuN)-Bu-t=Ta(CH2 Bu-t)(3).

Full metadata record

DC Field	Value	Language
dc.contributor.author	Chiu, HT	en_US
dc.contributor.author	Chang, YH	en_US
dc.contributor.author	Chang, PJ	en_US
dc.contributor.author	Wu, JB	en_US
dc.contributor.author	Peng, SM	en_US
dc.contributor.author	Lee, GH	en_US
dc.date.accessioned	2014-12-08T15:42:30Z	-
dc.date.available	2014-12-08T15:42:30Z	-
dc.date.issued	2002-04-07	en_US
dc.identifier.issn	0065-7727	en_US
dc.identifier.uri	http://hdl.handle.net/11536/28863	-
dc.language.iso	en_US	en_US
dc.title	Metallo-organic chemical vapor deposition of tantalum carbide and tantalum nitride thin films from (BuCH)-Bu-t=Ta(CH2 Bu-t)(3) and (BuN)-Bu-t=Ta(CH2 Bu-t)(3).	en_US
dc.type	Meeting Abstract	en_US
dc.identifier.journal	ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY	en_US
dc.citation.volume	223	en_US
dc.citation.issue		en_US
dc.citation.spage	A48	en_US
dc.citation.epage	A48	en_US
dc.contributor.department	應用化學系	zh_TW
dc.contributor.department	Department of Applied Chemistry	en_US
dc.identifier.wosnumber	WOS:000176296800281	-
dc.citation.woscount	0	-
Appears in Collections:	Articles