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DC 欄位語言
dc.contributor.authorLIN, JKen_US
dc.contributor.authorCHANG, CYen_US
dc.contributor.authorWANG, THen_US
dc.contributor.authorHUANG, HSen_US
dc.contributor.authorCHEN, KLen_US
dc.contributor.authorHO, TSen_US
dc.contributor.authorKO, Jen_US
dc.date.accessioned2014-12-08T15:04:23Z-
dc.date.available2014-12-08T15:04:23Z-
dc.date.issued1993-09-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.32.3748en_US
dc.identifier.urihttp://hdl.handle.net/11536/2890-
dc.description.abstractCharge loss in interpolyoxide erasable programmable read-only memories (EPROMs) due to program disturbance by alternating current pulses applied to the drain was studied for the first time. It was found that the charge loss due to ac stress is more severe than that due to dc stress. Experimental results reveal that the more positive the floating gate potential, the more severe is the drain ac disturbance observed. The main reason for the charge loss is the displacement current which agitates the charges in the floating gate, creating a leakage path from the floating gate to the drain, in which the drain-to-floating-gate overlapping capacitance C(fd) plays an important role. The drain dc stresses of interpolyoxide/nitride/oxide (ONO) EPROMs were also measured under different bias conditions and temperatures. The data show that higher dc electric field of the floating gate to the drain results in larger V(th) shift, which can be accelerated by elevated temperature. In addition, the control gate ac stress-enhanced drain dc disturbance was also measured. We proposed that the dc drain stress is applied during the ac gate stress, which results in a heating effect. The results support the concept of dielectric ac heating.en_US
dc.language.isoen_USen_US
dc.subjectAC STRESSen_US
dc.subjectEPROMen_US
dc.subjectPROGRAM DISTURBANCEen_US
dc.subjectDISPLACEMENT CURRENTen_US
dc.subjectHEATINGen_US
dc.subjectCOUPLING RATIOen_US
dc.titleCHARGE LOSS DUE TO AC PROGRAM DISTURBANCE STRESSES IN EPROMSen_US
dc.typeArticleen_US
dc.identifier.doi10.1143/JJAP.32.3748en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERSen_US
dc.citation.volume32en_US
dc.citation.issue9Aen_US
dc.citation.spage3748en_US
dc.citation.epage3753en_US
dc.contributor.department電控工程研究所zh_TW
dc.contributor.departmentInstitute of Electrical and Control Engineeringen_US
dc.identifier.wosnumberWOS:A1993LZ48900013-
dc.citation.woscount2-
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