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dc.contributor.authorChen, SHen_US
dc.contributor.authorChang, Len_US
dc.contributor.authorChang, EYen_US
dc.contributor.authorChang, CYen_US
dc.date.accessioned2014-12-08T15:42:52Z-
dc.date.available2014-12-08T15:42:52Z-
dc.date.issued2002-01-15en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.41.L20en_US
dc.identifier.urihttp://hdl.handle.net/11536/29067-
dc.description.abstractA high-power-density enhancement-mode AlGaAs/InGaAs pseudomorphic high-electron-mobility transistor (E-PHEMT) is developed for the Japanese personal handy-phone system (PHS). The E-PHEMT has a total gate width of 3.36 mm with a gate length of 0.5 mum. The E-PHEMT shows a high power density of 247 mW/mm at 3.6 V, 196 mW/mm at 3 V, 152 mW/mm at 2.4 V and 63 mW/mm at 1.2 V, this is the highest power density reported so far for E-PHEMT with similar device size and bias conditions. When the E-PHEMT was qualified by 1.9 GHz pi/4-shifted quadrature phase shift keying (QPSK) modulated signal for PHS at 2,4 V with idle current of 30 mA. the device shows a linear PAE of 35.1% with associated power gain of 15.5 dB at output power of 22.4 dBm. The adjacent channel leakage power (P(adj)) of the de ice is -56.6 dBc at 600 kHz apart from the center frequency. The E-PHEMT meets PHS specifications and demonstrates high power density, excellent power efficiency and linearity at low bias voltage.en_US
dc.language.isoen_USen_US
dc.subjectenhancement-modeen_US
dc.subjectsingle voltage operationen_US
dc.subjectPHEMT power amplifieren_US
dc.subjecthigh power densityen_US
dc.subjectPHSen_US
dc.subjectAlGaAs/InGaAsen_US
dc.titleLow-voltage-operation high-power-density AlGaAs/InGaAs enhancement-mode pseudomorphic high-electron-mobility transistor for personal handy-phone handset applicationen_US
dc.typeArticleen_US
dc.identifier.doi10.1143/JJAP.41.L20en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERSen_US
dc.citation.volume41en_US
dc.citation.issue1ABen_US
dc.citation.spageL20en_US
dc.citation.epageL23en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.department友訊交大聯合研發中心zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.contributor.departmentD Link NCTU Joint Res Ctren_US
dc.identifier.wosnumberWOS:000173882600007-
dc.citation.woscount2-
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