Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Chen, SH | en_US |
dc.contributor.author | Chang, L | en_US |
dc.contributor.author | Chang, EY | en_US |
dc.contributor.author | Chang, CY | en_US |
dc.date.accessioned | 2014-12-08T15:42:52Z | - |
dc.date.available | 2014-12-08T15:42:52Z | - |
dc.date.issued | 2002-01-15 | en_US |
dc.identifier.issn | 0021-4922 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1143/JJAP.41.L20 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/29067 | - |
dc.description.abstract | A high-power-density enhancement-mode AlGaAs/InGaAs pseudomorphic high-electron-mobility transistor (E-PHEMT) is developed for the Japanese personal handy-phone system (PHS). The E-PHEMT has a total gate width of 3.36 mm with a gate length of 0.5 mum. The E-PHEMT shows a high power density of 247 mW/mm at 3.6 V, 196 mW/mm at 3 V, 152 mW/mm at 2.4 V and 63 mW/mm at 1.2 V, this is the highest power density reported so far for E-PHEMT with similar device size and bias conditions. When the E-PHEMT was qualified by 1.9 GHz pi/4-shifted quadrature phase shift keying (QPSK) modulated signal for PHS at 2,4 V with idle current of 30 mA. the device shows a linear PAE of 35.1% with associated power gain of 15.5 dB at output power of 22.4 dBm. The adjacent channel leakage power (P(adj)) of the de ice is -56.6 dBc at 600 kHz apart from the center frequency. The E-PHEMT meets PHS specifications and demonstrates high power density, excellent power efficiency and linearity at low bias voltage. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | enhancement-mode | en_US |
dc.subject | single voltage operation | en_US |
dc.subject | PHEMT power amplifier | en_US |
dc.subject | high power density | en_US |
dc.subject | PHS | en_US |
dc.subject | AlGaAs/InGaAs | en_US |
dc.title | Low-voltage-operation high-power-density AlGaAs/InGaAs enhancement-mode pseudomorphic high-electron-mobility transistor for personal handy-phone handset application | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1143/JJAP.41.L20 | en_US |
dc.identifier.journal | JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | en_US |
dc.citation.volume | 41 | en_US |
dc.citation.issue | 1AB | en_US |
dc.citation.spage | L20 | en_US |
dc.citation.epage | L23 | en_US |
dc.contributor.department | 材料科學與工程學系 | zh_TW |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | 友訊交大聯合研發中心 | zh_TW |
dc.contributor.department | Department of Materials Science and Engineering | en_US |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.contributor.department | D Link NCTU Joint Res Ctr | en_US |
dc.identifier.wosnumber | WOS:000173882600007 | - |
dc.citation.woscount | 2 | - |
Appears in Collections: | Articles |
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