標題: Novel chip standby current prediction model and ultrathin gate oxide scaling limit
作者: Su, HD
Chiou, BS
Lu, PC
Chang, MH
Lee, KH
Chao, CP
See, YC
Sung, JYC
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
關鍵字: ultrathin oxide;inverter;gate current;standby current;temperature dependence
公開日期: 1-Jan-2002
摘要: In deep sub-micron technology, leakage current of the oxide layer has a severe impact on chip power consumption due to the scaling down of oxide thickness. The inverter circuit model proposed in this paper provides a simple and quick method of predicting chip standby current. This model takes into account both the conventional device-off current and the inversion gate current, as compared to the conventional approach in which the gate leakage current is small and neglected. The temperature dependence study shows that the logarithm of the device-off current is inversely proportional to temperature. From 25 C, the device-off current increases tenfold for a temperature increase of 50 C, while the inversion gate current is almost temperature independent. Hence, a more aggressive oxide scaling rule could be employed in high-performance products operated at higher temperatures under the same device-off current/inversion gate current ratio.
URI: http://hdl.handle.net/11536/29157
ISSN: 0021-4922
期刊: JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
Volume: 41
Issue: 1
起始頁: 59
結束頁: 65
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