標題: | Control system design for a rapid thermal processing system |
作者: | Lin, CA Jan, YK 電控工程研究所 Institute of Electrical and Control Engineering |
關鍵字: | output feedback;proportional plus integral (PI) controller;rapid thermal processing (RTP);reduced order system;single-wafer process;temperature control;temperature measurement |
公開日期: | 1-Jan-2001 |
摘要: | This paper proposes a control system design for a rapid thermal processing (RTP) system, which has four circular concentric lamp zones and four temperature sensors. The control system consists of a least square feedforward controller and an output feedback proportional plus integral (PI) controller. The goal is to maintain uniform temperature tracking for typical ramp-up and hold-steady profiles. A high-order nonlinear model describing the temperature dynamics of the rapid thermal processing (RTP) system is used for the feedforward controller design. A balanced reduced model, obtained from a linear model around a desired uniform steady-state temperature, is used for the design of the multiinput-multioutput (MIMO) PI controller. The PI controller gain matrices are designed using an LQR-based procedure. Tradeoff between robustness and performance of the system is discussed, Simulation results show the control system designed yields robust temperature tracking with good uniformity for a wide temperature range. |
URI: | http://dx.doi.org/10.1109/87.896753 http://hdl.handle.net/11536/29999 |
ISSN: | 1063-6536 |
DOI: | 10.1109/87.896753 |
期刊: | IEEE TRANSACTIONS ON CONTROL SYSTEMS TECHNOLOGY |
Volume: | 9 |
Issue: | 1 |
起始頁: | 122 |
結束頁: | 129 |
Appears in Collections: | Articles |
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