完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Lin, CA | en_US |
dc.contributor.author | Jan, YK | en_US |
dc.date.accessioned | 2014-12-08T15:44:25Z | - |
dc.date.available | 2014-12-08T15:44:25Z | - |
dc.date.issued | 2001-01-01 | en_US |
dc.identifier.issn | 1063-6536 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1109/87.896753 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/29999 | - |
dc.description.abstract | This paper proposes a control system design for a rapid thermal processing (RTP) system, which has four circular concentric lamp zones and four temperature sensors. The control system consists of a least square feedforward controller and an output feedback proportional plus integral (PI) controller. The goal is to maintain uniform temperature tracking for typical ramp-up and hold-steady profiles. A high-order nonlinear model describing the temperature dynamics of the rapid thermal processing (RTP) system is used for the feedforward controller design. A balanced reduced model, obtained from a linear model around a desired uniform steady-state temperature, is used for the design of the multiinput-multioutput (MIMO) PI controller. The PI controller gain matrices are designed using an LQR-based procedure. Tradeoff between robustness and performance of the system is discussed, Simulation results show the control system designed yields robust temperature tracking with good uniformity for a wide temperature range. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | output feedback | en_US |
dc.subject | proportional plus integral (PI) controller | en_US |
dc.subject | rapid thermal processing (RTP) | en_US |
dc.subject | reduced order system | en_US |
dc.subject | single-wafer process | en_US |
dc.subject | temperature control | en_US |
dc.subject | temperature measurement | en_US |
dc.title | Control system design for a rapid thermal processing system | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1109/87.896753 | en_US |
dc.identifier.journal | IEEE TRANSACTIONS ON CONTROL SYSTEMS TECHNOLOGY | en_US |
dc.citation.volume | 9 | en_US |
dc.citation.issue | 1 | en_US |
dc.citation.spage | 122 | en_US |
dc.citation.epage | 129 | en_US |
dc.contributor.department | 電控工程研究所 | zh_TW |
dc.contributor.department | Institute of Electrical and Control Engineering | en_US |
dc.identifier.wosnumber | WOS:000166627500015 | - |
dc.citation.woscount | 9 | - |
顯示於類別: | 期刊論文 |